New Products

Inert gas atmosphere curing

May 15, 2007

Inert gas atmosphere curing
Surrey UK
GEW has incorporated nitrogen into its N2 UV lamp head system for inert gas atmosphere curing of inks and coatings, and coupled the technology with its new e-Brick electronic power supply. GEW says users of the system will benefit from a 30 percent reduction in power consumption and a 20 percent boost in UV output. Inert gas atmosphere technology is used as a means of eliminating oxygen inhibition within inks or coatings, allowing a reduction of chemistry related photoinitiators. GEW has developed its system based on a sealed curing chamber built around a dedicated idler roll. Oxygen is purged from the chamber using nitrogen that is introduced in a controlled manner.